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Article
Publication date: 1 January 1986

R.K. Sadhir and H.E. Saunders

The paper describes the plasma polymerisation process for depositing ultrathin films. Such films, deposited from monomers containing hydrophobic elements such as hexafluorobenzene…

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Abstract

The paper describes the plasma polymerisation process for depositing ultrathin films. Such films, deposited from monomers containing hydrophobic elements such as hexafluorobenzene and hexamethyldisiloxane, showed excellent water vapour barrier properties, due to dense, highly crosslinked and rigid structures of the films. The composition and structure of the plasma polymerised films have been elucidated by ESCA and infra‐red spectroscopy.

Details

Microelectronics International, vol. 3 no. 1
Type: Research Article
ISSN: 1356-5362

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