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Article
Publication date: 1 April 1997

N. Imber, M. Hershcovitz, A. Ashur and I. E. Klein

A study was undertaken to correlate macroscopic profile variations in the photoresist duringlift‐off procedures with changes in material properties. It was established that…

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Abstract

A study was undertaken to correlate macroscopic profile variations in the photoresist during lift‐off procedures with changes in material properties. It was established that soaking in chlorobenzene, which gave rise to negative slopes, was accompanied by hardening of the top layer of the photoresist and caused the surface to become hydrophobic. FTIR measurements did not yield new information about variations in chemical bonding.

Details

Microelectronics International, vol. 14 no. 1
Type: Research Article
ISSN: 1356-5362

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