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1 – 4 of 4Ming-Hui Liu, Jianbin Xiong, Chun-Lin Li, Weijun Sun, Qinghua Zhang and Yuyu Zhang
The diagnosis and prediction methods used for estimating the health conditions of the bearing are of great significance in modern petrochemical industries. This paper aims to…
Abstract
Purpose
The diagnosis and prediction methods used for estimating the health conditions of the bearing are of great significance in modern petrochemical industries. This paper aims to discuss the accuracy and stability of improved empirical mode decomposition (EMD) algorithm in bearing fault diagnosis.
Design/methodology/approach
This paper adopts the improved adaptive complementary ensemble empirical mode decomposition (ICEEMD) to process the nonlinear and nonstationary signals. Two data sets including a multistage centrifugal fan data set from the laboratory and a motor bearing data set from the Case Western Reserve University are used to perform experiments. Furthermore, the proposed fault diagnosis method, combined with intelligent methods, is evaluated by using two data sets. The proposed method achieved accuracies of 99.62% and 99.17%. Through the experiment of two data, it can be seen that the proposed algorithm has excellent performance in the accuracy and stability of diagnosis.
Findings
According to the review papers, as one of the effective decomposition methods to deal with nonlinear nonstationary signals, the method based on EMD has been widely used in bearing fault diagnosis. However, EMD is often used to figure out the nonlinear nonstationarity of fault data, but the traditional EMD is prone to modal confusion, and the white noise in signal reconstruction is difficult to eliminate.
Research limitations/implications
In this paper only the top three optimal intrinsic mode functions (IMFs) are selected, but IMFs with less correlation cannot completely deny their value. Considering the actual working conditions of petrochemical units, the feasibility of this method in compound fault diagnosis needs to be studied.
Originality/value
Different from traditional methods, ICEEMD not only does not need human intervention and setting but also improves the extraction efficiency of feature information. Then, it is combined with a data-driven approach to complete the data preprocessing, and further carries out the fault identification and classification with the optimized convolutional neural network.
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Jianbin Xiong, Jinji Nie and Jiehao Li
This paper primarily aims to focus on a review of convolutional neural network (CNN)-based eye control systems. The performance of CNNs in big data has led to the development of…
Abstract
Purpose
This paper primarily aims to focus on a review of convolutional neural network (CNN)-based eye control systems. The performance of CNNs in big data has led to the development of eye control systems. Therefore, a review of eye control systems based on CNNs is helpful for future research.
Design/methodology/approach
In this paper, first, it covers the fundamentals of the eye control system as well as the fundamentals of CNNs. Second, the standard CNN model and the target detection model are summarized. The eye control system’s CNN gaze estimation approach and model are next described and summarized. Finally, the progress of the gaze estimation of the eye control system is discussed and anticipated.
Findings
The eye control system accomplishes the control effect using gaze estimation technology, which focuses on the features and information of the eyeball, eye movement and gaze, among other things. The traditional eye control system adopts pupil monitoring, pupil positioning, Hough algorithm and other methods. This study will focus on a CNN-based eye control system. First of all, the authors present the CNN model, which is effective in image identification, target detection and tracking. Furthermore, the CNN-based eye control system is separated into three categories: semantic information, monocular/binocular and full-face. Finally, three challenges linked to the development of an eye control system based on a CNN are discussed, along with possible solutions.
Originality/value
This research can provide theoretical and engineering basis for the eye control system platform. In addition, it also summarizes the ideas of predecessors to support the development of future research.
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Yuquan Ni, Guangneng Dong, Qi Liu, Wei Wang and Yihong Li
Babbitt bush is easy to cause severe adhesive wear due to unexpected journal fall. This paper aims to improve wear resistance of Babbitt bush.
Abstract
Purpose
Babbitt bush is easy to cause severe adhesive wear due to unexpected journal fall. This paper aims to improve wear resistance of Babbitt bush.
Design/methodology/approach
A soft/hard hybrid surface mircoprofile of Babbitt alloy/steel was fabricated by a technology of laser texture combined with hot-pressing. The friction and wear performances of bare steel (steel-h), Babbitt bush on steel (steel-s) and Babbitt filled in dimples of steel (steel-hs) were conducted on a ball-on-disc tester under dry and lubricated conditions.
Findings
The results showed that wettability of steel-hs was enhanced by forming soft/hard hybrid surface. Compared with steel-s, the stability of friction coefficient curve of steel-hs was improved without increasing coefficient friction. The wear resistance of steel-hs was remarkably enhanced under dry and lubricated conditions.
Originality/value
The originality of this paper is as following: to improve the tribological properties and to prolong service life of steel-s, soft/hard hybrid surface of Babbitt filled in dimples of steel substrate was successfully fabricated by laser texturing combined with hot-pressing. This paper showed that the lipophilicity of steel-hs was best among those of steel-s and steel-h. Babbitt alloy as a soft filler on dimples of steel substrate improved anti-wear of steel-s remarkably. It provides a new way to fabricate Babbitt as bushing on steel substrate.
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Yanfu Wang, Xin Wang and Lifei Liu
Lapping is a vital flattening process to improve the quality of processed semiconductor wafers such as single-crystal sapphire wafers. This study aims to optimise the lapping…
Abstract
Purpose
Lapping is a vital flattening process to improve the quality of processed semiconductor wafers such as single-crystal sapphire wafers. This study aims to optimise the lapping process of the fixed-abrasive lapping plate of sapphire wafers with good overall performance [i.e. high material removal rate (MRR), small surface roughness (Ra) of the wafers after lapping and small lapping plate wear ratio (η)].
Design/methodology/approach
The influence of process parameters such as lapping time, abrasive size, abrasive concentration, lapping pressure and lapping speed on MRR, Ra and η of lapping-processed sapphire wafers was studied, and the results were combined with experimental data to establish a regression model. The multi-evaluation index optimisation problem was transformed into a single-index optimisation problem via an entropy method and the grey relational analysis (GRA) to comprehensively evaluate the performance of each parameter.
Findings
The results revealed that lapping time, abrasive size, abrasive concentration, lapping pressure and lapping speed had different influence degrees on MRR, Ra and η. Among these parameters, lapping time, lapping speed and abrasive size had the most significant effects on MRR, Ra and η, and the established regression equations predicted the response values of MRR, Ra and η to be 99.56%, 99.51% and 93.88% and the relative errors between the predicted and actual measured values were <12%, respectively. With increased lapping time, MRR, Ra and η gradually decreased. With increased abrasive size, MRR increased nearly linearly, whereas Ra and η initially decreased but subsequently increased. With an increase in abrasive concentration, MRR, Ra and η initially increased but subsequently decreased. With increased lapping pressure, MRR and η increased nearly linearly and continuously, whereas Ra decreased nearly linearly and continuously. With increased lapping speed, Ra initially decreased sharply but subsequently increased gradually, whereas η initially increased sharply but subsequently decreased gradually; however, the change in MRR was not significant. Comparing the optimised results obtained via the analysis of influence law, the parameters optimised via the entropy method and GRA were used to obtain sapphire wafers lapping with an MRR of 4.26 µm/min, Ra of 0.141 µm and η of 25.08, and the lapping effect was significantly improved.
Originality/value
Therefore, GRA can provide new ideas for ultra-precision processing and process optimisation of semiconductor materials such as sapphire wafers.
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