Rabindra N. Das, Frank D. Egitto and Voya R. Markovich
The purpose of this paper is to discuss the use of epoxy‐based conducting adhesives in z‐axis interconnections.
Abstract
Purpose
The purpose of this paper is to discuss the use of epoxy‐based conducting adhesives in z‐axis interconnections.
Design/methodology/approach
A variety of conductive adhesives with particle sizes ranging from 80 nm to 15 μm were laminated into printed wiring board substrates. SEM and optical microscopy were used to investigate the micro‐structures, conducting mechanism and path. The mechanical strength of the various adhesives was characterized by 90° peel test and measurement of tensile strength. Reliability of the adhesives was ascertained by IR‐reflow, thermal cycling, pressure cooker test (PCT), and solder shock. Change in tensile strength of adhesives was within 10 percent after 1,000 cycles of deep thermal cycling (DTC) between −55 and 125°C.
Findings
The volume resistivity of copper, silver and low‐melting point (LMP) alloy based paste were 5 × 10−4, 5 × 10−5 and 2 × 10−5 Ω cm, respectively. Volume resistivity decreased with increasing curing temperature. Adhesives exhibited peel strength with Gould's JTC‐treated Cu as high as 2.75 lbs/in. for silver, and as low as 1.00 lb/in. for LMP alloy. Similarly, tensile strength for silver, copper and LMP alloy were 3,370, 2,056 and 600 ψ, respectively. There was no delamination for silver, copper and LMP alloy samples after 3X IR‐reflow, PCT, and solder shock. Among all, silver‐based adhesives showed the lowest volume resistivity and highest mechanical strength. It was found that with increasing curing temperature, the volume resistivity of the silver‐filled paste decreased due to sintering of metal particles.
Research limitations/applications
As a case study, an example of silver‐filled conductive adhesives as a z‐axis interconnect construction for a flip‐chip plastic ball grid array package with a 150 μm die pad pitch is given.
Originality/value
A high‐performance Z‐interconnect package can be provided which meets or exceeds JEDEC level requirements if specific materials, design, and manufacturing process requirements are met, resulting in an excellent package that can be used in single and multi‐chip applications. The processes and materials used to achieve smaller feature dimensions, satisfy stringent registration requirements, and achieve robust electrical interconnections are discussed.
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Rabindra N. Das, Frank D. Egitto and Voya R. Markovich
Material formulation, structuring and modification are key to increasing the unit volume complexity and density of next generation electronic packaging products. Laser processing…
Abstract
Purpose
Material formulation, structuring and modification are key to increasing the unit volume complexity and density of next generation electronic packaging products. Laser processing is finding an increasing number of applications in the fabrication of these advanced microelectronic devices. The purpose of this paper is to discuss the development of new laser‐processing capabilities involving the synthesis and optimization of materials for tunable device applications.
Design/methodology/approach
The paper focuses on the application of laser processing to two specific material areas, namely thin films and nanocomposite films. The examples include BaTiO3‐based thin films and BaTiO3 polymer‐based nanocomposites.
Findings
A variety of new regular and random 3D surface patterns are highlighted. A frequency‐tripled Nd:YAG laser operating at a wavelength of 355 nm is used for the micromachining study. The micromachining is used to make various patterned surface morphologies. Depending on the laser fluence used, one can form a “wavy,” random 3D structure, or an array of regular 3D patterns. Furthermore, the laser was used to generate free‐standing nano and micro particles from thin film surfaces. In the case of BaTiO3 polymer‐based nanocomposites, micromachining is used to generate arrays of variable‐thickness capacitors. The resultant thickness of the capacitors depends on the number of laser pulses applied. Micromachining is also used to make long, deep, multiple channels in capacitance layers. When these channels are filled with metal, the spacings between two metallized channels acted as individual vertical capacitors, and parallel connection eventually produce vertical multilayer capacitors. For a given volume of capacitor material, theoretical capacitance calculations are made for variable channel widths and spacings. For comparison, calculations are also made for a “normal” capacitor, that is, a horizontal capacitor having a single pair of electrodes.
Research limitations/implications
This technique can be used to prepare capacitors of various thicknesses from the same capacitance layer, and ultimately can produce variable capacitance density, or a library of capacitors. The process is also capable of making vertical 3D multilayer embedded capacitors from a single capacitance layer. The capacitance benefit of the vertical multilayer capacitors is more pronounced for thicker capacitance layers. The application of a laser processing approach can greatly enhance the utility and optimization of new materials and the devices formed from them.
Originality/value
Laser micromaching technology is developed to fabricate several new structures. It is possible to synthesize nano and micro particles from thin film surfaces. Laser micromachining can produce a variety of random, as well as regular, 3D patterns. As the demand grows for complex multifunctional embedded components for advanced organic packaging, laser micromachining will continue to provide unique opportunities.