Mirosław Gracjan Gierczak, Eugeniusz Prociów and Andrzej Dziedzic
This paper aims to focus on the fabrication and characterization of mixed thin-/thick-film thermoelectric microgenerators, based on magnetron sputtered constantan (copper–nickel…
Abstract
Purpose
This paper aims to focus on the fabrication and characterization of mixed thin-/thick-film thermoelectric microgenerators, based on magnetron sputtered constantan (copper–nickel alloy) and screen-printed silver. To improve the adhesion of the constantan layer to the applied substrates, the additional chromium sublayer was used. The aim of the study was to investigate the influence of chromium sublayer on the electrical and thermoelectric properties of such hybrid microgenerators.
Design/methodology/approach
Fabrication of such structures consisted of several steps – magnetron sputtering of the chromium and then constantan layer, exposing the first arms of thermocouples, applying the second arms by screen-printing technology and firing the prepared structures in a belt furnace. The structures were made both on Al2O3 (alumina) and low temperature co-fired ceramics (LTCC) substrates.
Findings
To the best of the authors’ knowledge, for the first time, laser ablation process was applied to fabricate the first arms of thermocouples from a layer of constantan only or constantan with a chromium sublayer. Geometric measurements have shown that the mapping of mask pattern by laser ablation technique is very accurate.
Originality/value
The determined Seebeck coefficient of the realized structures was about 40.4 µV/K. After firing the exemplary structures at 850°C peak temperature, Seebeck coefficient is increased to an average value of 51 µV/K.
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Piotr Markowski, Eugeniusz Prociów and Łukasz Urbaniak
The purpose of this paper is to determine the thermoelectric properties of the germanium-based thin films and selecting the most suitable ones for fabrication of micrognerators…
Abstract
Purpose
The purpose of this paper is to determine the thermoelectric properties of the germanium-based thin films and selecting the most suitable ones for fabrication of micrognerators.
Design/methodology/approach
The germanium layers were deposited by low pressure magnetron sputtering method, in the pressure of 10−3/104 mbar range. The amount of dopants (germanium or vanadium) was changed in a limited extent. The influence of such changes on the layers output properties was studied. Post-processing heat treatment at temperature below 823 K was applied to activate the layers. It leads to improve the electrical and thermoelectrical performance.
Findings
The special attention was paid to the power factor (PF = S2/ρ) of the layers. To estimate power factor (PF) electrical resistivity (ρ) and Seebeck coefficient (S) were determined. The achieved Seebeck coefficient value was 185 Volt/Kelvin (μV/K) for germanium doped with vanadium (Ge:V1.15) and 225 μV/K for germanium doped with gold(Ge:Au3.13) layers at room temperature. After activation process, the PF reached a value of 2.5 × 10−4 W/m · K2 for the Ge:Au3.13 and 1.1 × 10−4 W/m · K2 for the Ge:V1.15 layers.
Originality/value
The fabricated thermoelectric layers can be thermally annealed in temperature up to 823 K in the air and in 1,023 K under a nitrogen atmosphere. This enables integration of thin layers with thick-film technology. Corning glass or low temperature cofired ceramic was used as a substrate.