Christoph R. Pobel, Fuad Osmanlic, Matthias A. Lodes, Sebastian Wachter and Carolin Körner
Selective electron beam melting (SEBM) is a highly versatile powder bed fusion additive manufacturing method. SEBM is characterized by high energy densities which can be applied…
Abstract
Purpose
Selective electron beam melting (SEBM) is a highly versatile powder bed fusion additive manufacturing method. SEBM is characterized by high energy densities which can be applied with nearly inertia free beam deflection at high speeds (<8.000 m/s). This paper aims to determine processing maps for Ti-6Al-4V on an Arcam Q10 machine with LaB6 cathode design.
Design/methodology/approach
Scan line spacings of 100, 50 and 20 µm in a broad parameter range, focusing on high deflection and build speeds are investigated.
Findings
There are broad processing windows for dense parts without surface flaws for all scan line spacings which are defined by the total energy input and the area melting velocity.
Originality/value
The differences and limitations are discussed taking into account the beam properties at high beam energy and velocity as well as evaporation related loss of alloying components.
Details
Keywords
Christopher Arnold, Christoph Pobel, Fuad Osmanlic and Carolin Körner
The purpose of this study is the introduction and validation of a new technique for process monitoring during electron beam melting (EBM).
Abstract
Purpose
The purpose of this study is the introduction and validation of a new technique for process monitoring during electron beam melting (EBM).
Design/methodology/approach
In this study, a backscatter electron detector inside the building chamber is used for image acquisition during EBM process. By systematic variation of process parameters, the ability of displaying different topographies, especially pores, is investigated. The results are evaluated in terms of porosity and compared with optical microscopy and X-ray computed tomography.
Findings
The method is capable of detecting major flaws (e.g. pores) and gives information about the quality of the resulting component.
Originality/value
Image acquisition by evaluating backscatter electrons during EBM process is a new approach in process monitoring which avoids disadvantages restricting previously investigated techniques.