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In recent years, the demand for garments has significantly increased, requiring manufacturers to speed up their production to attract customers. Cut order planning (COP) is one of the most important processes in the apparel manufacturing industry. The appropriate stencil arrangement can reduce costs and fabric waste. The COP problem focuses on determining the size combination for a pattern, which is determined by the length of the cutting table, width, demand order, and height of the cutting equipment.

This study proposes new heuristics: genetic algorithm (GA), symbiotic organism search, and divide-and-search-based Lite heuristic and a One-by-One (ObO) heuristic to address the COP problem. The objective of the COP problem is to determine the optimal combination of stencils to meet demand requirements and minimize the total fabric length.

A comparison between our proposed heuristics and other simulated annealing and GA-based heuristics, and a hybrid approach (conventional algorithm + GA) was conducted to demonstrate the effectiveness and efficiency of the proposed heuristics. The test results show that the ObO heuristic can significantly improve the solution efficiency and find the near optimal solution for extreme demands.

This paper proposes a new heuristic, the One-by-One (ObO) heuristic, to solve the COP problem. The results show that the proposed approaches overcome the long operation time required to determine the fitting arrangement of stencils. In particular, our proposed ObO heuristic can significantly improve the solution efficiency, i.e. finding the near optimal solution for extreme demands within a very short time.

This paper presents a comprehensive study using bibliometric and social network analysis (SNA) to depict the academic community, research hotspots and the correlation between research performance and social network measurements within Library Hi Tech.

Publications from Library Hi Tech between 2010 and 2022 are reviewed and analysed through coauthorship analysis, co-occurrence analysis, SNA and the Spearman rank correlation test.

The annual number of publications in Library Hi Tech increased from 2016 to 2022, indicating that this research has gradually gained global attention. The USA and China are the most significant contributors to the relevant publications. Scholars in this field mainly engage in small-scale cooperation. Academic libraries, digital libraries, libraries, information technology and COVID-19 were hot topics during the study period. In light of the COVID-19 pandemic, there was a marked increase in research on healthcare. Academic interest in the internet of Things and social media has proliferated recently and may soon attract more attention. Spearman rank correlation analysis shows that research performance (i.e. publication count and citation count) is significantly and positively correlated with social network measurements (i.e. degree centrality, betweenness centrality, closeness centrality and eigenvector centrality) in studies of Library Hi Tech.

This paper reveals a systematic picture of the research landscape of Library Hi Tech and provides a potential guide for future research. The relationship between scientific research performance and social network measurements can be objectively identified based on statistical knowledge.